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Etching Lead Frame

An etched lead frame is a critical interconnect component within semiconductor packages, manufactured using a precise photochemical etching process. Unlike traditional stamped lead frames, etching employs chemical agents to selectively remove material from thin metal sheets, forming intricate, high-density patterns with exceptional accuracy.

Products Detail

  • Features:

    High Precision and Complexity: Capable of producing extremely fine features, tight tolerances (e.g., ±0.025mm), and complex geometries without mechanical stress, burrs, or deformation. This is essential for fine-pitch, multi-row, and lead-on-chip (LOC) designs.
    Design Flexibility: Rapid prototyping and design changes are easier and less costly, as only digital photomasks need updating instead of hard stamping tools.
    Material Versatility: Can process a wide range of metals and alloys, including thinner and more delicate materials that are unsuitable for stamping.
    Cost-Effectiveness for Low/Medium Volumes: Lower initial tooling costs make etching economical for prototyping, pre-production, and medium-volume runs.
    Stress-Free: The process introduces no mechanical stress or micro-cracks, preserving the material's inherent properties and improving reliability.
  • Specs:

    Material: C194/C7025/EFTEC-64
    Thickness: 0.1-0.254mm
    Plating: AG/NipdAu
    Roughening
  • Application:

    Etched lead frames are widely used in advanced semiconductor packages where precision is paramount:
    High-Density Packages: QFN (Quad Flat No-lead), DFN (Dual Flat No-lead), SON (Small Outline No-lead), and other advanced CSP (Chip Scale Package) formats.
    Power Devices: Thicker, high-current lead frames for power MOSFETs, IGBTs, and automotive modules.
    RF & Microwave Packages: Packages requiring precise transmission line structures.
    MEMS & Sensor Packages: Customized designs for specialized applications.
    Multi-Row & Complex Arrays: Packages with intricate internal leads and tie bars.

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